Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.
Titanium silicide is excellent in oxidation resistance at high temperatures, and is used as a heat resistant material, a high temperature heating element, and the like. The method for producing titanium silicide employs a method of heating titanium metal and silicon at a high temperature in a hydrogen atmosphere and an inert atmosphere.
Titanium silicide can be widely used in microelectronics and semiconductors, aviation high temperature materials, coating materials, ceramic materials, ceramic targets and other fields.